Sputtered Thin Films Theory and Fractal Descriptions Engineering Materials Series
Auteurs : Mwema Frederick Madaraka, Akinlabi Esther Titilayo, Oladijo Oluseyi Philip
Sputtered Thin Films: Theory and Fractal Descriptions provides an overview of sputtered thin films and demystifies the concept of fractal theory in analysis of sputtered thin films. It simplifies the use of fractal tools in studying the growth and properties of thin films during sputtering processes. Part 1 of the book describes the basics and theory of thin film sputtering and fractals. Part 2 consists of examples illustrating specific descriptions of thin films using fractal methods.
- Discusses thin film growth, structure, and properties
- Covers fractal theory
- Presents methods of fractal measurements
- Offers typical examples of fractal descriptions of thin films grown via magnetron sputtering processes
- Describes application of fractal theory in prediction of thin film growth and properties
This reference book is aimed at engineers and scientists working across a variety of disciplines including materials science and metallurgy as well as mechanical, manufacturing, electrical, and biomedical engineering.
Part 1. Theory. 1. Thin Film Growth, Structure, and Properties. 2. Fractal Theory. 3. Methods of Fractal Measurements. Part 2. Typical Studies of Fractal Descriptions of Sputtered Films. 4. Fractal Characterization of Hillocks and Porosity in Sputtered Films. 5. Fractal Analyses of Roughness of Sputtered Films. 6. Multifractal Characterization of Structure Evolution with Sputtering Parameters of Thin Films. 7. Fractal Prediction of Film Growth and Properties.
Date de parution : 09-2023
15.6x23.4 cm
Date de parution : 04-2021
15.6x23.4 cm
Thèmes de Sputtered Thin Films :
Mots-clés :
surface enginering; materials characterization; fractal theory; materials science; materials science and engineering; ZnS Thin Film; Fractal measurements; Al Thin Films; Thin film growth; Fractal Dimension; Magnetron sputtering processes; Generalized Hurst Exponent; Multifractal Spectrum; Magnetron Sputtering; Argon Gas Flow Rate; ZnO Thin Film; RF Magnetron Sputtering; Hurst Exponent; Aluminium Thin Films; Thin Film Surfaces; Multifractal Analysis; Alloy Thin Films; Substrate Temperature; Thin Films Deposited; MFDA; Generalized Fractal Dimension; CdTe Thin Films; Box Counting Method; AlN Thin Film; Multifractal Behavior; LAGBs; AFM Image